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Robust and Reliable Actinic Ptychographic Imaging of Highly Periodic Structures in EUV Photomasks

Bin Wang,Nathan Brooks,Michael Tanksalvala,Yuka Esashi, Nicolas Jenkins,Peter Johnsen,Iona Binnie,Guan Gui,Yunzhe Shao,Margaret M. Murnane,Henry C. Kapteyn

PHOTOMASK TECHNOLOGY 2022（2022）

Cited 5|Views14
Key words
extreme ultraviolet lithography,photomask,actinic,EUV,coherent diffractive imaging,high harmonic generation,metrology,periodic structures
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