Holistic Litho-Etch Development to Address Patterning Challenges Towards High NA EUV
Seiji Nagahara,Arnaud Dauendorffer, Xiang Liu,Tomoya Onitsuka,Hisashi Genjima,Noriaki Nagamine,Yuhei Kuwahara,Yuya Kamei,Shinichiro Kawakami,Makoto Muramatsu,Satoru Shimura,Kathleen Nafus,Noriaki Oikawa,Yannick Feurprier,Marc Demand,Sophie Thibaut,Alexandra Krawicz,Steven Grzeskowiak,Katie Lutker-Lee,Eric Liu,Christopher Catano, Joshua D. LaRose, Jeffrery C. Shearer,Lior Huli,Philippe Foubert,Danilo De Simone International Conference on Extreme Ultraviolet Lithography 2022（2022）
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