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Line-edge Roughness Performance Targets for EUV Lithography

Timothy A. Brunner,Xuemei Chen,Allen Gabor,Craig Higgins,Lei Sun,Chris A. Mack

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VIII（2017）

Cited 16|Views1
Key words
EUV Lithography,Line Edge Roughness,Line Width Roughness,Pattern Defects,Yield,Local CD Uniformity,Stochastic Resist Models
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