Study of Electron-Induced Chemical Transformations in Model Resists
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023（2023）
Key words
secondary electrons,residual gas analysis (RGA),Fourier-transform infrared spectroscopy (FTIR),electron-induced chemistry,electron-gun exposure,outgassing,model photoresists,extreme ultraviolet lithography (EUV)
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