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A Low-Temperature Photoresist-Based Film-Profile Engineering Scheme for Fabricating Bottom- and Double-Gated Indium–gallium–zinc Oxide TFTs

JAPANESE JOURNAL OF APPLIED PHYSICS(2024)

Cited 0|Views6
Key words
oxide semiconductors,thin-film transistor,film-profile engineering,low-temperature processing,atomic layer deposition,indium-gallium-zinc oxide
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