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EUV Patterned Gate Variation Reduction in Next Generation Transistor Architectures

Gopal Sankar Kenath,Martin Burkhardt, Nikhil Jain, Anna Lin,Jennifer Church,Gen Tsutsui, Stephanie Reynoso, Xuan Liu, Chris Sheraw,Pietro Montanini,Eric Miller,Indira Seshadri,Luciana Meli,Nelson Felix

OPTICAL AND EUV NANOLITHOGRAPHY XXXVII（2024）

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Key words
EUV Lithography,Gate All Around Transistors,LWR,LER,Stochastics
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