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Effect of Sputtering Pressure on the Properties of Large Area IWO Thin Films Deposited by Direct Current Magnetron Sputtering

Tianyu Yu,Yunlei Jiang,Suxia Liang,Zhiguo Zhao, Sheng Zou,Jie Su,Renjie Hua,Cang Liang, Wangfan Chen, Mi Zhang,Wenjun Zhang,Lei Shi,Yuan Dong

Current Applied Physics（2024）

Cited 0|Views22
Key words
IWO,Magnetron sputtering,Optoelectronic properties,Sputtering pressure,ST-PSCs
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