Operando Study of HfO2 Atomic Layer Deposition on Partially Hydroxylated Si(111)Rosemary Jones,Giulio D'Acunto,Payam Shayesteh, Indiana Pinsard,Francois Rochet,Fabrice Bournel,Jean-Jacques Gallet,Ashley Head,Joachim SchnadtJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A（2024）引用 4|浏览22AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
