Performance and Reliability of Technology Qualified 34 Mb Split-Gate Eflash Macro in 28 Nm HKMG

Ralf Richter,Stefan Duenkel, Bert Mueller, Frank Mauersberger, Sven Wittek,Sven Beyer, Jana Boehme, Uwe Ritter,Violetta Sessi, Zhen Xu,Maximilian Drescher, Jinho Kim,Parviz Ghazavi,Yuri Tkachev, Latt Tee, Zonglin Li,Mandana Tadayoni, Fan Luo,Nhan Do, Serguei Jourba, Catherine Decobert, Gilles Festes, Bruno Villard, Thibaut Pate-Cazal

2024 IEEE INTERNATIONAL MEMORY WORKSHOP, IMW（2024）

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Key words

ESF3,split-gate Flash cell,floating gate,HKMG,28nm,28SLPe

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