Contact Optimization Through Annealing and Edge Functionalization Towards 2D TMD Nanosheet Devices
2024 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI TSA（2024）
Key words
Nanosheet Devices,Thermal Annealing,Top Contact,Nitrogen Plasma,Edge Contact,Band Gap,Plasma Power,Interlayer Coupling
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