Developing the Keep-Important-Samples Scheme for Training the Advanced CNN-based Automatic Virtual Metrology Models
IEEE ROBOTICS AND AUTOMATION LETTERS（2024）
Key words
Metrology,Data models,Accuracy,Inspection,Semiconductor process modeling,Predictive models,Semiconductor device modeling,Automatic virtual metrology (AVM),imbalanced regression,cosine distance,convolutional neural networks (CNN),convolutional autoencoder (CAE)
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