Ge2Sb2Se4Te-based Reconfigurable On-Chip Metasurface NIR Filter

Cosmin–Constantin Popescu,Kiumars Aryana, Parth Garud,Khoi Phuong Dao,Steven Vitale,Christopher Roberts,Vladimir Liberman,Hyung–Bin Bae,Tae Woo Lee,Myungkoo Kang,Kathleen A. Richardson,Carlos A. Ríos Ocampo,Yifei Zhang,Tian Gu,Juejun Hu,Hyun Jung Kim

2024 Conference on Lasers and Electro-Optics (CLEO)（2024）

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Key words

Metasurface,Phase Change,Extinction Coefficient,Device Performance,Heat Resistance,Light Beam,Delamination,Electron Beam Lithography,Refractive Index Change,Reactive Ion Etching,Filter Type,Phase Change Materials,Device Behavior,Low Refractive Index,Effective Medium Theory,Optical Memory,Beam Attenuation,Metal Heat,Phase Transition Material

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