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Improved Oxidation Behavior of Hf0.11Al0.20B0.69 in Comparison to Hf0.28B0.72 Magnetron Sputtered Thin Films

Pauline Kuemmerl,Sebastian Lellig,Amir Hossein Navidi Kashani,Marcus Hans,Peter J. Poellmann,Lukas Loefler,Ganesh Kumar Nayak,Damian M. Holzapfel,Szilard Kolozsvari,Peter Polcik,Peter Schweizer,Daniel Primetzhofer,Johann Michler,Jochen M. Schneider

SCIENTIFIC REPORTS（2024）

Cited 1|Views7

Key words

Thin films,Coatings,Borides,High temperature oxidation,HfAlB2,Magnetron sputtering

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