Study of Mask Error Enhancement Factor Improvement with Low-N Absorber Extreme Ultraviolet Lithography Mask

Yosuke Takahata,Tatiana Kovalevich,Danilo De Simone,Yusuke Tanaka,Vicky Philipsen

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3（2024）

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关键词

extreme ultraviolet lithography,mask error enhancement factor,low-n absorber mask,mask three-dimensional effects,metal oxide resist,S-litho extreme ultraviolet

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