Logic and Memory Patterning Breakthrough Using High-NA Lithography
Victor M. Blanco Carballo,Syamashree Roy, Bhavishya Chowrira,Van Tuong Pham, Johan Wouters, Shubhankar Das,Stefan Decoster,Philippe Leray, Ru-Gun Liu,Kurt Ronse,Geert Vandenberghe,Ardavan Niroomand,Philippe Foubert, Vito Daniele Rutigliani,Hyo Seon Suh,Mihir Gupta,Danilo De Simone,Mircea Dusa,Christophe Beral,Vicky Philipsen,Vincent Wiaux,Joern Holger Franke,Joost Bekaert,Balakumar Baskaran,Werner Gillijns,Ryoung han Kim,Yasser Sherazi, Hemant Vats, Miroslav Cupak, Carol Chang, Yun-Jing Lin, Jeonghoon Lee,Soobin Hwang,Kiho Yang,Kenichi Miyaguchi Photomask Technology 2024（2024）
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