Interface Modification Based on the Homoepitaxial MOCVD-MgO Process: Optimizing the Performance of the Flexible Atomic Layer Thermopile Heat Flux Sensor
IEEE SENSORS JOURNAL（2025）
Key words
Sensors,Heating systems,Surface treatment,Surface morphology,Epitaxial growth,Crystals,Substrates,Surface roughness,Rough surfaces,Temperature sensors,Atomic layer thermopile (ALTP),heat flux sensor,homoepitaxial MgO (homo-MgO),interface modification layer,metal organic chemical vapor deposition (MOCVD)
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