Influence of the RF-power on the Etching Yields and Surface Morphology in Reactive Ion Beam Etching of Si and PhotoresistErik Rohkamm,Daniel Spemann,Frank Scholze,Frank FrostJOURNAL OF APPLIED PHYSICS（2024）引用 0|浏览3AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
