Investigation of the Etching Mechanism of Silicon Nitride by CF4/O2/Ar Gas Mixture Plasma in ICP Liyue Gong, Qian Luo, Ziyan Tan, Chan Li,Na Li, Xinjie Wang,Fei Gao,Yongxin Liu,Zhenhua Bi,Xianxiu MeiVACUUM（2025）引用 0|浏览2关键词CF4/O-2/Ar,Plasma etching,Silicon nitride,Etching rate,Plasma diagnosticAI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
