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Adhesion-induced MoS2 Layer Transfer Via In-Situ TEM-nanoindentation: Effects of Curvature and Substrate Mediated Residual Stress

Jhih H. Liang,Mehdi Rouhani,J. David Schall, Takaaki Sato,Christopher Muratore,Nicholas R. Glavin,Robert W. Carpick,Yeau-Ren Jeng

Applied Surface Science Advances（2025）

Cited 0|Views2
Key words
In-situ tem,MoS2,2D,Adhesion,Nanoindentation,Raman spectroscopy,XPS
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