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Single-Step Production of Doubly Re-entrant Microstructures Through Reaction-Diffusion Photolithography for Omniphobic Surfaces

Hyung Han Bae, Jong Bin Kim,Hwan-Young Lee,Shin-Hyun Kim

SMALL(2025)

Cited 0|Views1
Key words
cassie-Baxter state,doubly re-entrant microstructures,microfabrication,omniphobic,reaction-diffusion photolithography
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