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Boosting the Photoresponse of Transistor Memory Utilizing the Ferroelectric Polarization Effect of Polyfluorene/PVDF-Based Copolymer Blends

ACS APPLIED ELECTRONIC MATERIALS(2025)

Natl Taipei Univ Technol | Natl Taiwan Univ | Natl Synchrotron Radiat Res Ctr | Natl Cheng Kung Univ

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Abstract
In this study, a ferroelectric phototransistor memory is developed by blending poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) with a conjugated polymer, poly(9,9-dioctylfluorene) (PFO), at ratios of 4:1, 1:1, and 1:4, using the polymer blending systems as the electrets. The impact of ferroelectric polarization on phototransistor memory is investigated. Since the strong intermolecular interactions introduced by P(VDF-TrFE) and the formation of a typical ferroelectric crystalline phase, the electrical performance of the ferroelectric phototransistor memory with conjugated PFO, which provides strong photoresponse, is significantly improved. Electrical characterization of the memory devices shows that increasing the P(VDF-TrFE) ratio enhances the current stability, with the 1:4 blending ratio achieving a high memory ratio (I ON/I OFF) of up to 106. Additionally, when a gate voltage is applied during the photowriting process, the device exhibits a distinct ferroelectric polarization effect to boost the photoresponse and long-term stability with an I ON/I OFF ratio close to 108 and maintained after 10,000 s. This improvement is also attributed to the channel's prolonged and electret's shortened exciton lifetimes using time-resolved photoluminescence spectroscopy with different light excitations. Both are beneficial for boosting the channel's photocurrent and charge trapping in the electret. This study reveals that a ferroelectric and photoresponsive electret can significantly influence phototransistor memory's optical, morphological, and electrical properties, improving memory behavior and stability. Compared to the traditional bilayer structures comprising ferroelectric dielectric and photoresponsive electret, this design significantly simplifies the ferroelectric photomemory's device architecture. This provides an approach for developing efficient and stable ferroelectric phototransistor memory devices for future applications.
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Key words
phototransistor,nonvolatile memory,field-effecttransistors,polyfluorene,ferroelectric
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要点】:本研究通过将聚(9,9-二辛基芴)(PFO)与聚(偏氟乙烯-三氟乙烯)共聚物(P(VDF-TrFE))混合,开发了一种具有铁电效应的光敏晶体管存储器,显著提高了其光电响应性能和稳定性。

方法】:通过不同比例混合PFO和P(VDF-TrFE)制备聚合物混合体系,利用P(VDF-TrFE)引入的强分子间相互作用和形成的典型铁电结晶相,增强光敏晶体管存储器的电学性能。

实验】:使用不同比例(4:1、1:1和1:4)的PFO和P(VDF-TrFE)混合体系,在电学性能表征中发现1:4比例混合的器件电流稳定性增强,实现了高达10^6的开关电流比(I ON/I OFF)。在光写入过程中施加栅极电压,器件表现出明显的铁电极化效应,开关电流比接近10^8,并在10,000秒后保持稳定。通过时间分辨光致发光光谱研究了不同光照下通道和电介质中激子寿命的变化,这些变化有助于提升通道的光电流和电荷陷阱效应。