WNxCy VT Tuning of Split Gate Nanosheet CFETs with Dual Work Function Metals Achieving 0.93 VT Match/Improved 0.24V Noise Margin/Record Gain of 61V/V
2024 IEEE International Electron Devices Meeting (IEDM)（2024）
Key words
Nanosheets,Work Function,Metal Work Function,Epitaxial,Inverter,Epitaxial Growth,Types Of Pain,Flexible Design,EDS Mapping,Metal Gate,Top Gate
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