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Controllable P-Type Doping Strategy for High-Performance 2D Material Complementary Inverters.

ACS applied materials & interfaces(2025)

School of Flexible Electronics | National Laboratory of Solid-State Microstructure

Cited 0|Views6
Abstract
Controllable doping is required to modulate the electrical properties of the semiconductor devices. Such controllability is a particular issue in p-type doping for two-dimensional (2D) semiconductors. Here, we present a controllable doping strategy for modulating carrier density and threshold voltage of WSe2 transistors via surface oxidation at 200 °C in air. The hole density in the WSe2 channel can be precisely modulated from 1 × 1011 cm-2 to 3.5 × 1012 cm-2 by increasing oxidation duration, while its carrier mobility is virtually unaffected, maintaining a high value of 94.3 cm2·V-1·s-1. This controllable doping method can help to achieve balanced carrier transport in the n-type and p-type transistors in CMOS devices. The doped p-type WSe2 transistor in a CMOS inverter resulted in a high gain of 52 and a lower static power of 0.256 nW at a bias voltage of 1 V. Therefore, our findings might pave the way for reliable fabrication of high-performance 2D electronic circuits.
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要点】:论文提出了一种可控的p型掺杂策略,通过表面氧化调控二维半导体WSe2的载流子密度和阈值电压,实现了高性能的二维材料互补反相器。

方法】:通过在空气中200°C下对WSe2进行表面氧化处理,精确调节其通道中的空穴密度。

实验】:通过增加氧化时间,将WSe2通道中的空穴密度从1 × 10^11 cm^-2调控至3.5 × 10^12 cm^-2,同时保持了94.3 cm^2·V^-1·s^-1的高载流子迁移率。实验使用的数据集为WSe2晶体管特性数据,最终实现了CMOS反相器的高增益(52)和低静态功耗(0.256 nW)。