Modeling the Charging Effect on the Twisting Defects During High Aspect Ratio Etching of Dielectrics
2025 Conference of Science and Technology of Integrated Circuits (CSTIC)（2025）
关键词
Plasma Etching,Monte Carlo Simulation,Charge Density,Energy Distribution,Typical Reaction,Charged Particles,Electric Field Distribution,Charge Accumulation,Surface Profile,Etching Process,Poisson Equation,Simulation Domain,Neutral Particles,Charge Transition,Potential Asymmetry
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