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Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Philipp Taus,Adrian Prinz,Heinz D. Wanzenboeck,Patrick Schuller, Anton Tsenov,Markus Schinnerl,Mostafa M. Shawrav,Michael Haslinger,Michael Muehlberger

Nanomaterials（2021）

Cited 5|Views20
Key words
nanoimprint lithography (NIL),undercut features,master,Blu-Ray patterning,reactive ion etching
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