R+D Progress Towards a Diffraction Limited Upgrade of the ALS
6th Int Particle Accelerator Conf (IPAC'15), Richmond, VA, USA, May 3-8, 2015（2015）
关键词
Resolution Limits,Chemically Amplified Resists,High-Resolution Patterning,Ambient Pressure Photoelectron Spectroscopy,Surface Photovoltage
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