Si Multi-Bridge Channel CMOS Inverter with Five Stacked Layers Fabricated from Epitaxial Si0.8Ge0.2/Si Multilayers
2024 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI TSA（2024）
Key words
Epitaxial,NOT Gate,Channel Width,Etching Process,Selective Etching,Chemical Vapor Deposition,Gate Dielectric,Sacrificial Layer,Metal Gate
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